EON™ 2070 EUV Photoresist
EONTM 2070 is a positive EUV photoresist developed for dense contact hole patterning focusing on very high-resolution capability itself and low CDU value with high exposure dose. EONTM 2070 is offered in viscosities which will cover thickness ranges from 40nm to 70nm.
Features & Benefits
- High resolution capability (<35P hole patterns)
- Excellent CDU
- Wide process window
- Outstanding blob defectivity
- Good etch resistance
Product Details
45P dense contact holes of EONTM 2070
70nm Film THK on Si hard-mask
For further product information please contact your Qnity
Technical Sales Representative.
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