Epic™ photoresists for ArF lithography

Epic™ photoresists are a series of resists widely used for 193 nm (ArF) processes with and without topcoats. Epic™ IM photoresists are designed for the unique environment created by immersion lithography, in which water between the lens and the wafer enables exposure of finer patterns.

Features & Benefits

Prevents resist components that leach into water from penetrating the resist film
Creates a barrier layer between the water and the resist, making a separate topcoat layer unnecessary, saving customers process time and money
High resolution and defectivity photoresist used for positive tone development (PTD) or negative tone development (NTD) process applications

Applications

Epic™ photoresists are widely used for advanced nodes for logic and memory.

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Epic™ photoresists for ArF lithography