Qnity Expands Offerings for Extreme Ultraviolet Lithography to Enable Advanced Node Semiconductor Manufacturing

Press Release | February 10, 2026
Press Release
Qnity Expands Offerings for Extreme Ultraviolet Lithography to Enable Advanced Node Semiconductor Manufacturing
 
 
 

New photoresist platform strengthens Qnity’s integrated lithography materials lineup

WILMINGTON, Del., Feb. 10, 2026 Qnity Electronics, Inc. (“Qnity”) (NYSE: Q), a premier technology solutions leader across the semiconductor value chain, today announced the expansion of its offerings for extreme ultraviolet (EUV) lithography with the introduction of the Eon™ EUV photoresist product family. The addition strengthens Qnity’s commitment to delivering next-generation solutions that power the next leap in advanced node semiconductor manufacturing.

“EUV lithography has become the foundation for enabling next-generation logic and memory scaling, and the material requirements only intensify as geometries shrink,” said Randal King, Chief Technology and Sustainability Officer at Qnity. “By introducing Eon™ EUV photoresists into our integrated EUV materials lineup, we’re strengthening Qnity’s ability to help customers overcome the increasing complexities of EUV patterning while continuing to drive semiconductor innovation at advanced nodes.”

Introducing Eon™ EUV Photoresists

The Eon™ EUV photoresist product line delivers the precision EUV patterning required for the industry’s most advanced logic and memory devices. It provides excellent performance in linewidth roughness and critical dimension uniformity, enabling smooth, consistent feature profiles essential for high yield and long-term device reliability.

Eon™ EUV photoresists also offer customers a broad process window that maintains stable performance under exposure variations, helping manufacturers reduce sensitivity to process fluctuations and improve overall operational flexibility. Its strong stochastic defect control—including reduced post-etch and blob type defectivity—addresses one of EUV lithography’s most persistent challenges, resulting in cleaner wafers and improved yield. Robust etch resistance further maintains feature integrity throughout pattern transfer, enabling accurate reproduction of the intended device structures.

Advancing Qnity’s EUV Materials Family — AR™ EUV Underlayer and EUVSolv™ EUV Cleans

Qnity’s expansion of its EUV materials family builds on a proven foundation. The company also supports high resolution, low defect patterning through its AR™ EUV underlayer materials and EUV clean solutions through its EUVSolv™ MC series, both of which also expanded on leading technologies for other processes.

AR™ EUV underlayer materials are designed to operate synergistically with EUV photoresists, enhancing overall lithography performance. AR™ EUV underlayers broaden the photoresist’s process window, stabilize exposure conditions, and improve pattern fidelity under demanding manufacturing environments. Tailored formulations increase EUV photon absorption and enhance acid generation efficiency within the resist, helping mitigate pattern collapse, missing hole defects, and other challenges that arise at the most advanced dimensions.

In parallel, EUVSolv™ EUV cleans are mask cleaning solutions, which help customers reduce defect contamination in EUV environments. EUVSolv™ EUV cleans effectively remove tin and metal particles while protecting critical mask layers—including the antireflective coating and protective capping layers—to maintain mask integrity and support cleaner, more reliable EUV patterning.

With the addition of Eon™ EUV photoresists, Qnity now offers a suite of complementary EUV materials to enable next-generation patterning, supporting customers across all lithography wavelengths.

Meet Qnity at Semiconductor Industry Events

Qnity will feature its advanced lithography materials at two industry events this month. Join Qnity at SEMICON Korea in the Qnity Lounge, Feb. 11-13, in Seoul, Korea; or at technical presentations and booth #703 at the SPIE Advanced Lithography + Patterning Conference, Feb. 22-26 in San Jose, Calif.

Interested parties seeking additional information about Qnity’s EUV materials should contact their account managers or submit an inquiry online.

 
 
 

About Qnity 
Qnity is a premier technology provider across the semiconductor value chain, empowering AI, high performance computing, and advanced connectivity. From groundbreaking solutions for semiconductor chip manufacturing, to enabling high-speed transmission within complex electronic systems, our high-performance materials and integration expertise make tomorrow’s technologies possible. More information about the company, its businesses and solutions can be found at www.qnityelectronics.com.

Qnity™, the Qnity Node Logo, and all products, unless otherwise noted, denoted with TM or ® are trademarks, trade names or registered trademarks of affiliates of Qnity Electronics, Inc.

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Media Contact

Ashley Boucher

ashley.boucher@qnityelectronics.com

 
 
 
 
 
 
 
 
 

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