Epic™ IM ArF immersion photoresist
EPIC™ IM 5033 is a positive tone immersion 193 photoresist designed for advanced logic and memory devices. This technology has been optimized for dense line-space applications. Epic™ IM 5033 resist has high contrast, good line width roughness (LWR), excellent resolution and low defectivity.
Features & Benefits
- Excellent pattern fidelity for 2D features
- Straight pattern profile without pattern collapse
- Good LWR and low defectivity
- Capable of single exposure printing 37nm 1 to 1
- Excellent etch resistance
- Adaptable to dry and topcoat-free immersion applications
Product Details
Feature size: 38nm
SB/PEB=100/90, 60sec, Thickness=1,000A
For further product information please contact your Qnity
Technical Sales Representative.
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