Microposit™ and Megaposit™ photoresists for g-line and i-line lithography

 
 
 

Microposit™ and Megaposit™ photoresists for g-line and i-line lithography

Our Microposit™ g-line (436nm) and Megaposit™ i-line (365nm) and photoresists deliver reliable, high-precision patterning solutions for a wide range of semiconductor and electronic device manufacturing processes.  
 

Features & Benefits

  • High resolution and stability: Optimized for fine pattern formation
  • Consistent performance across processes: Reliable results for various substrates and workflows
  • Enhanced process efficiency: Improved yield and productivity with uniform coating and easy processing
  • Cost-effective solutions: Choose the right resist for your application

Applications

  • Front-end semiconductor processes (ICs, power devices)
  • MEMS and sensor fabrication
  • Display and optical component patterning

Featured products

 
 
 
 
 
 

For further product information please contact your Qnity
Technical Sales Representative.

 
 
 
 
 
 
 
 
 

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