UV™ photoresists for KrF/deep UV lithography

 
 
 

UV™ photoresists for KrF/deep UV lithography

Our UV™ KrF photoresists, designed for 248nm excimer laser lithography, deliver superior resolution and process reliability for advanced semiconductor manufacturing. 
 

Features & Benefits

  • Superior resolution for advanced nodes: Optimized for fine patterning in next-generation devices
  • Excellent line edge roughness control: Achieve precise shapes for higher yield
  • Enhanced process stability: Reliable performance in high-volume production
  • Compatibility with multi-layer processes: Ideal for complex device architectures

Applications

  • Advanced logic and memory device fabrication
  • System large-scale integration (LSI) and system-on-chip (SoC) fabrication
  • MEMS and sensor production
  • Optical devices and photonics

Featured products

 
 
 
 
 
 

For further product information please contact your Qnity
Technical Sales Representative.

 
 
 
 
 
 
 
 
 

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