SPIE Advanced Lithography + Patterning 2026
February 22 – 26
San Jose, California , U.S
Qnity is proud to sponsor SPIE Advanced Lithography + Patterning 2026. Visit us at Booth 703 to meet our experts and join our technical presentations to explore the latest advancements in advanced lithography, with a special focus on materials for extreme ultraviolet (EUV) lithography and sustainable lithography solutions
Tuesday, February 24: 10:00 am – 5:00 pm
Wednesday, February 25: 10:00 am – 4:00 pm
Visit our exhibit to connect with Qnity’s experts to explore advanced lithography solutions for next-generation semiconductor manufacturing; and learn more about Qnity and our comprehensive product offerings for the electronics industry.
Tuesday, February 24 (PST Time)
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8:00 am |
Optimization of polymer design for CDU improvement in EUV photoresists |
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9:00 am |
PAG design and its formulation consideration for high NA EUV applications |
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3:50 pm |
Challenges and solutions to realize high EUV absorption advanced chemically amplified photoresists |
Wednesday, February 25 (PST Time)
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10:30 am |
Progress toward the achievement of a non-fluorine (NF) patterning materials toolbox |
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11:30 am |
Evaluation of a non-fluorine (non-PFAS) ArF-immersion photoresist used in semi-conductor manufacturing Optimizing quantum efficiency of photoactive compounds to improve ArF photoresist performance CDSAXS measurement of 3D profiles of EUV-patterned contact hole arrays |
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5:30pm |
Driving PFAS replacement with a resilient supply chain Progress toward non-fluorine (non-PFAS) ArF-immersion photoresist Development of multi-functional EUV resist materials |
Discover Breakthroughs in Advanced Lithography Materials
EUV Technologies
- Eon™ 2070 EUV photoresist
- Eon™ 1040 EUV photoresist
- Qnity Expands Offerings for Extreme Ultraviolet Lithography to Enable Advanced Node Semiconductor Manufacturing
Sustainable Lithography Materials
Qnity’s Lithography Solution
- Photoresists
- Functional sublayers
- Lithographic material innovation continues to enable the semiconductor industry
- Lithography brand pages
For more information and to connect with Qnity while at SPIE, please contact us here.
For more information about SPIE, please visit the SPIE Advanced Lithography + Patterning website.
Media Contact
For media interviews or any media-related inquiries:
Ashley Boucher
Head of Executive and Employee Communications
856.430.0755
Ashley.boucher@qnityelectronics.com
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