Qnity offers a broad, production-proven range of photoresists with material options that meet requirements across generations of lithography processes from 436nm down to 13.5nm wavelengths, and enable printing of feature size from 10µm down to 10nm.
The drive toward advanced semiconductor device nodes means photoresists must deliver higher resolution with manufacturable process windows and fewer defects. From our g-line, i-line, KrF and ArF photoresists, to our most advanced product families for extreme ultraviolet (EUV) lithography, Qnity has photoresists to match your needs. Combined with Qnity’s complementary overcoats and ancillary products, you get a total materials solution to support your semiconductor manufacturing processes.
Our broad product suite also allows us to tailor photoresists to meet your specific requirements.
Qnity’s robust, production-proven photoresist product line offers materials options that meet the requirements across generations of lithography processes.
Used in conjunction with photoresists, Qnity’s advanced overcoat materials are designed to prevent defects and improve the lithography process window, enabling finer feature patterns.
Functional sublayer materials enabling advanced DUV, ArF, and EUV patterning for logic and memory devices
Qnity’s roots run deep in its production-proven line of ancillary lithography products. From developers, removers, and other enhancement chemistries, we support a total lithography solution.
We love to talk about how our electronics solutions can build business, commercialize products,
and solve the challenges of our time.