Our functional sublayer products, including DUV and ArF bottom anti-reflective coating (BARC) materials, gap-fill materials, and extreme ultraviolet (EUV) underlayers, provide critical functions for the manufacture of logic and memory devices.
For further product information please contact your Qnity
Technical Sales Representative.
Functional sublayer materials enabling advanced DUV, ArF, and EUV patterning for logic and memory devices
Used in conjunction with photoresists, Qnity’s advanced overcoat materials are designed to prevent defects and improve the lithography process window, enabling finer feature patterns.
Qnity’s robust, production-proven photoresist product line offers materials options that meet the requirements across generations of lithography processes.
Qnity’s roots run deep in its production-proven line of ancillary lithography products. From developers, removers, and other enhancement chemistries, we support a total lithography solution.
We love to talk about how our electronics solutions can build business, commercialize products,
and solve the challenges of our time.