MICROPOSIT™ EBR™ 10A EDGE BEAD REMOVER

MICROPOSIT™ EBR™ 10A EDGE BEAD REMOVER

Qnity’s robust, production-proven photoresist product line offers materials options that meet the requirements across generations of lithography processes.

 
 
 

Features & benefits

  • Creates a barrier layer between the water and the resist, making a barrier layer unnecessary, saving customers time and money
  • Prevents resist components that leach into water from penetrating the resist film
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    Available Sizes

    Gross Weight Net Weight Carton Each Carton Length Carton Weight Carton Height
    KAR 0 0 0
     
     
     
     
     
     
    Product Details

    Fabric/material

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    Design

    EBR-10A

    Seam

    SURF BULK MAR

    Packaging

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    Hazard

    Coated Material

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    Features

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    Technical Resources
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      Safety Data Sheets(All Languages)
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